Gas supply system for semiconductor manufacturing apparatus

Details Gas supply system for semiconductor manufacturing apparatus Gas supply system for semiconductor manufacturing apparatus

2011-01-04

2011-01-04

Lawrence, Frank M (Department: 1797)

Gas separation

Combined or convertible

C055SDIG015, C062S617000

Reexamination Certificate

active

07862638

ABSTRACT:
A gas supply system according to the present invention comprises a gas filter disposed in a gas supply flow passage through which a gas is supplied to a semiconductor manufacturing apparatus and a metal component remover disposed in the gas supply flow passage downstream relative to the gas filter, which removes a volatile metal component contained in the gas flowing through the gas supply flow passage by liquefying the volatile metal component. The structure adopted in the gas supply system prevents entry of the volatile metal component, which cannot be eliminated through the gas filter, into the semiconductor manufacturing apparatus as the corrosive gas is supplied thereto by the gas supply flow passage.

REFERENCES:
patent: 6444011 (2002-09-01), Li et al.
patent: 6488745 (2002-12-01), Gu
patent: 6863019 (2005-03-01), Shamouilian et al.
patent: 7108737 (2006-09-01), Neumann et al.
patent: 2004/0037768 (2004-02-01), Jackson
patent: 2007/0031321 (2007-02-01), Alvarez et al.
patent: 5-68826 (1993-03-01), None
patent: 5-68865 (1993-03-01), None

Affiliated with

Also associated with

Rating

Gas supply system for semiconductor manufacturing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas supply system for semiconductor manufacturing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas supply system for semiconductor manufacturing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2663757