Gas supply system for a pumping arrangement

Fluid handling – Systems – With flow control means for branched passages

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C417S423400

Reexamination Certificate

active

07900652

ABSTRACT:
A system (100) for supplying an inert purge gas to a pumping arrangement (106) includes a plurality of flexible capillary tubes (102) each for conveying the gas from a respective outlet of a manifold (12) to a respective port (104) of the pumping arrangement (106). The internal diameter and length of each tube (102) control the gas flow rate to the respective port (104).

REFERENCES:
patent: 4725204 (1988-02-01), Powell
patent: 6155502 (2000-12-01), Liou et al.
patent: 6341615 (2002-01-01), Zorich et al.
patent: 2001/0054377 (2001-12-01), Lindfors et al.
patent: 2008/0017260 (2008-01-01), Oh et al.
patent: 1 118 136 (1956-05-01), None
patent: 63-106389 (1988-05-01), None
patent: 10-259793 (1998-09-01), None
Iguchi Masashi, Sakurai Mitsuru, Okamoto Masatomo; Abstract of JP10259793 A, entitled “Molecular Pump,” Osaka Shinku Kiki Seisakusho; Sep. 29, 1998.
Naya Kotaro, Mihashi Shinji, Shiiki Kazuaki, Hayakawa Tadashi;Abstract of JP63106389 A, entitled “Injection Device for Screw Type Vacuum Pump,” Hitachi Ltd; May 11, 1988.
United Kingdom Search Report of Application No. GB0411679.4 mailed Aug. 13, 2004; Claims Searched: 1-21; Date of Search: Aug. 12, 2004.
PCT Notification of Transmittal of the International Search Report and the Written Opinion of the International Searching Authority, or the Declaration of International Application No. PCT/GB2005/001580; Date of mailing: Sep. 14, 2005.
PCT International Search Report of International Application No. PCT/GB2005/001580; Date of mailing of the International Search Report: Sep. 14, 2005.
PCT Written Opinion of the International Searching Authority of International Application No. PCT/GB2005/001580; Date of mailing: Sep. 14, 2005.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas supply system for a pumping arrangement does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas supply system for a pumping arrangement, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas supply system for a pumping arrangement will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2760664

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.