Gas supply method in a CVD coating system for precursors...

Coating processes – Optical element produced

Reexamination Certificate

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C427S255230, C118S728000

Reexamination Certificate

active

07413767

ABSTRACT:
A method for producing optical functional coatings comprising niobium, tantalum, titanium or aluminum by supplying a precursor gas of low vapor pressure in a CVD coating system. A precursor selected from the group consisting of Nb, Ta, Ti, and Al compounds having a vapor pressure is maintained within a first supply container at a first temperature T1and a first pressure p1. Precursor vapor of the precursor is supplied from the first supply container to an intermediate storage device through a first gas line which fluidly communicates the first supply container and the intermediate storage device. A carrier gas or reaction gas is supplied to the first gas line such that a mixture of the precursor with the carrier gas or the reaction gas is provided. The mixture is maintained in the intermediate storage device at a constant second pressure p2lower than the first pressure p1and at a second temperature T2lower than the first temperature T1, and the mixture is supplied from the intermediate storage device through a second gas line.

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