Gas supply apparatus

Refrigeration – Storage of solidified or liquified gas – Liquified gas transferred as liquid

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122 4A, F17C 902

Patent

active

052791297

ABSTRACT:
According to this invention, a gas supply apparatus includes a bomb, a mass flow controller, a valve, and a heating means. The bomb is filled with a liquid gas. The mass flow controller controls a flow rate of an evaporated gas supplied from the bomb to supply the liquid gas having a vapor pressure lower than an atmospheric pressure to a vacuum vessel evacuated at a predetermined degree of vacuum through a long pipe. A valve is arranged between the bomb and the mass flow controller and performs supply/interruption of the gas flowing into the mass flow controller. A heater heats the mass flow controller, the valve, and a pipe for connecting the mass flow controller and the valve.

REFERENCES:
patent: 4348873 (1982-09-01), Yamauchi et al.
H. B. Bell et al., "Reactive Ion Etching of Aluminum/Silicon in BBr.sub.3 /Cl.sub.2 and BCl.sub.3 /Cl.sub.2 Mixtures", J. Electrochem, Soc.: Solid-State Science and Technology May 1988, vol. 135, No. 5, pp. 1184-1191.

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