Gas shower, lithographic apparatus and use of a gas shower

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S492100, C250S428000, C250S43200R, C250S435000, C250S438000

Reexamination Certificate

active

07432513

ABSTRACT:
A gas shower to condition at least one optical path in an optical apparatus, wherein the gas shower includes a gas distribution chamber having a shower outlet side to supply gas to the optical path, the gas distribution chamber being configured to distribute the gas to the optical path, wherein the gas distribution chamber includes a substantially sharp tapered tip.

REFERENCES:
patent: 5469260 (1995-11-01), Takagi et al.
patent: 6415736 (2002-07-01), Hao et al.
patent: 6522385 (2003-02-01), Ahn et al.
patent: 6616767 (2003-09-01), Zhao et al.
patent: 7050149 (2006-05-01), Owa et al.
patent: 2001/0052322 (2001-12-01), Hirayama et al.
patent: 2002/0130276 (2002-09-01), Sogard
patent: 2005/0083496 (2005-04-01), Dansberg et al.
patent: 2005/0092249 (2005-05-01), Kilpela et al.
patent: 2005/0199182 (2005-09-01), Masuda et al.
patent: 2005/0221618 (2005-10-01), AmRhein et al.
patent: 2005/0223986 (2005-10-01), Choi et al.
patent: 2006/0055899 (2006-03-01), Van Der Net et al.
patent: 2006/0191637 (2006-08-01), Zajac et al.
patent: 0 498 499 (1997-08-01), None
patent: 1 536 458 (2005-06-01), None
patent: 2000-036453 (2000-02-01), None
patent: 2000036453 (2000-02-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas shower, lithographic apparatus and use of a gas shower does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas shower, lithographic apparatus and use of a gas shower, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas shower, lithographic apparatus and use of a gas shower will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4013917

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.