Gas sensor

Details Gas sensor Gas sensor

1990-10-18

1992-04-14

Niebling, John

Chemistry: electrical and wave energy

Apparatus

Electrolytic

73 3105, 204426, 204431, G01N 27407

Patent

active

051045133

ABSTRACT:
A sensor for selectively sensing the presence of halogenated gases, particularly HFC's, within an atmosphere. The apparatus includes a ceramic element containing either a mixture of alkali metal silicates and aluminum oxide or aluminosilicate which react with ions of the halogenated gas when the two are brought together forming a depletion layer on and within the ceramic. A preferred ceramic composition is a mixture of potassium slicate and either one of silicon dioxide or aluminum oxide. The sensor is formed with two electrodes on opposite sides of the ceramic having terminals connected into a circuit for detecting a potential difference across the depletion layer. Means are provided for detecting the potential differences and for producing a discernable signal in response thereto.

REFERENCES:
patent: 3751968 (1973-08-01), Loh et al.
patent: 3979625 (1976-09-01), Roberts
patent: 3991360 (1976-11-01), Orth et al.
patent: 4129418 (1978-12-01), Davis
patent: 4171341 (1979-10-01), Morgan
patent: 4822465 (1989-04-01), Jones et al.
patent: 4947125 (1990-08-01), De Pous

Affiliated with

Also associated with

Rating

Gas sensor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas sensor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas sensor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2346636