Gas scrubbing process and apparatus

Gas separation: processes – Electric or electrostatic field – With addition of liquid to gaseous fluid mixture

Reexamination Certificate

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Details

C095S079000, C096S027000, C096S053000, C096S055000, C096S077000, C422S004000, C422S120000, C422S186040

Reexamination Certificate

active

06986803

ABSTRACT:
Process and apparatus for gas cleaning, as in HVAC systems or semiconductor manufacturing clean rooms, for removing 99.999% of particulate and gaseous contaminants, which may be effectively used to remove and neutralize Bio-chem agents introduced by terrorists, having a first stage in which large quantities of positively charged liquid droplets are introduced into the gas to be cleaned so as to remove virtually all negatively charged particulates and at least 90% of neutral particulates and soluble gases; a second stage in which most positively charged droplets from the first stage are removed and remaining particulates are given a positive charge; a third stage in which large quantities of negatively charged liquid droplets are introduced to remove positively charged particulates and more soluble gas contaminants; and a fourth stage in which the negatively charged droplets are removed from the cleaned gas stream.

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