Gas scavenger

Details Gas scavenger Gas scavenger

1986-10-16

1987-12-08

Kittle, John E.

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

047111976

ABSTRACT:
A gas scavenger unit educts gases away from semiconductor wafers as they are withdrawn through a plenum in the scavenger from their processing chamber into the atmosphere. The scavenger has a peripheral wall which generally defines a plenum having two open ends. The one end of the plenum communicates with the processing chamber and the other end communicates with the atmosphere. An exhaust port in the peripheral wall communicates with a house gas exhaust system. The plenum is divided into two chambers by an apertured interior wall. The wafers travel through the first chamber, and the second chamber communicates with the house gas exhaust system. The apertures in the interior wall are disposed about the wafer travel path so that gases from the processing chamber and/or the atmosphere are educted into the house exhaust system without flowing across the wafers.

REFERENCES:
patent: 3920404 (1975-11-01), Gandhi et al.
patent: 3960509 (1976-06-01), Abriany
patent: 4094644 (1978-06-01), Wagner

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