Gas recirculation system for carbon dioxide lasers

Details Gas recirculation system for carbon dioxide lasers Gas recirculation system for carbon dioxide lasers

1979-08-13

1982-02-16

Sikes, William L.

Coherent light generators

Particular active media

Gas

372 60, 372 83, H01S 314

Patent

active

043161570

ABSTRACT:
A method and apparatus is described for reducing the gas consumption rate by controlling the gas composition in a repetitively pulsed high pressure and/or high energy density TE CO.sub.2 laser. Detrimental gas species formed in the discharge are removed by chemical reaction in the gas phase and the reaction products are removed by a trap in a recirculator loop. In particular, the primary detrimental species is oxygen, the reducing gas added to remove this is hydrogen or deuterium and the resulting oxides of hydrogen or deuterium are removed by a molecular sieve.

REFERENCES:
patent: 3789320 (1974-01-01), Hepburn
patent: 4229709 (1980-10-01), McMahan
"A Sealed High-Repetition-Rate TEA CO.sub.2 Laser", by Page et al., IEEE Jour. Quant. Elect., vol. QE-14, No. 4, Apr. 1978.
"Sealed TEA CO.sub.2 Lasers with External Control of Gas Chemistry", by Willis et al., Appl. Phys. Lett., vol. 31, No. 2, Jul. 15, 1977.
"Effect of Hydrogen on CO.sub.2 TEA Lasers", by Deutsch, Appl. Phys. Lett., vol. 20, 315, (1972).
"Effect of Deuterium on the Operation of a CO.sub.2 TEA Laser", by Albrecht et al., JETP Lett., vol. 21, No. 1, Jan. 5, 1975.
"A Compact Sealed Pulsed CO.sub.2 TEA Laser", by Stark et al., IEEE Jour. Quant. Elect., vol. QE-11, No. 9, Sep. 1975.

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