Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1997-07-07
2000-02-22
Stucker, Jeffrey
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
204164, 31511121, 422168, H05F 300
Patent
active
060276177
ABSTRACT:
A gas reactor includes a dielectric casing made of a dielectric material and forming a first conduit for directing first gas in one direction, a first electrode positioned inside the dielectric casing along a general center thereof and extending in the direction, at least one catalyst layer formed on a surface of the first electrode, and a second electrode surrounding an outer wall of the dielectric casing. The gas reactor further includes a power-supply unit applying AC power between the first electrode and the second electrode to generate glow discharge inside the dielectric casing.
REFERENCES:
patent: 5474747 (1995-12-01), Hayashi et al.
patent: 5492678 (1996-02-01), Ota et al.
Hayashi Yuji
Hiyane Masao
Matsumoto Hiroshige
Suib Steven L.
Tanabe Shuji
Fujitsu Limited
Hokushin Corporation
Honda Giken Kogyo Kabushiki Kaisha
Stucker Jeffrey
The University Of Connecticut
LandOfFree
Gas reactor for plasma discharge and catalytic action does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas reactor for plasma discharge and catalytic action, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas reactor for plasma discharge and catalytic action will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-517471