Gas reacting apparatus

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

422169, 422170, 422172, 422189, 422193, 422194, 422257, 422259, 422273, 422281, 552571, 55258, 55408, 261117, C01B 1700

Patent

active

048658170

ABSTRACT:
Gas reacting apparatus and method are described for wet mass transfer of solute gases from a gas stream with a liquid or slurry reacting medium capable of chemisorption of solute gases in the gas stream. The apparatus comprises an elongated conduit means defining a primary reaction zone in fluid-flow communication with a fan means defining both a secondary reaction zone and a spray coalescence zone, and plurality of dual fluid spray means coaxially spaced in series within the conduit means and countercurrently or cocurrently directed to the gas stream for spraying the liquid or slurry reacting medium into said conduit means to form a plurality of spray contact zones of uniformly-distributed fine droplets wherein intimate contact of high interfacial surface area between the sprayed liquid or slurry and the gas stream is effected to remove solute gases from the gas stream. The fan is operated at a relatively low speed to promote coalesence of droplets through droplet-droplet collisions followed by collection on the fan blades with liquid or slurry layers which, under the action of centrifugal forces, are separated in the form of an attendant annular spray zone of relatively large droplets to trap more of the solute gases. The droplets upon impingement on the fan casing are collected and removed by gravity, while the clean gas stream is exhausted from the fan casing. The apparatus may also include quenching means for saturating and cooling the gas stream prior to the removal of solute gases as well as an entrainment separator for further removing entrained droplets not separated by the fan means from the clean gas stream.

REFERENCES:
patent: 4272499 (1981-06-01), Cason et al.
patent: 4374813 (1983-02-01), Chen et al.
patent: 4484937 (1984-11-01), James et al.
patent: 4530822 (1985-07-01), Ahsley et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas reacting apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas reacting apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas reacting apparatus will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-914703

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.