Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2004-03-30
2008-03-25
Vanoy, Timothy C. (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C422S004000, C422S005000, C422S028000, C422S168000, C422S177000, C422S180000, C422S186040, C422S186180, C204S164000
Reexamination Certificate
active
07347979
ABSTRACT:
A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.
REFERENCES:
patent: 3983021 (1976-09-01), Henis
patent: 4871515 (1989-10-01), Reichle et al.
patent: 5637198 (1997-06-01), Breault
patent: 5711147 (1998-01-01), Vogtlin et al.
patent: 5843288 (1998-12-01), Yamamoto
patent: 5891220 (1999-04-01), Gary
patent: 7011796 (2006-03-01), Raybone et al.
patent: 7070744 (2006-07-01), Son
patent: 2003/0051993 (2003-03-01), Ricatto et al.
patent: 2003/0098230 (2003-05-01), Carlow et al.
patent: 2003/0150709 (2003-08-01), LaBarge et al.
patent: 2003/0170154 (2003-09-01), Inman et al.
patent: 2351151 (1999-12-01), None
patent: 196 11 332 (1957-09-01), None
patent: 42 09 196 (1993-07-01), None
patent: 195 34 950 (1997-03-01), None
patent: 0 716 274 (1996-06-01), None
patent: 0 608 619 (1997-10-01), None
patent: 0 902 721 (1999-03-01), None
patent: 2 270 013 (1994-03-01), None
patent: 05-309231 (1993-11-01), None
patent: 5-309231 (1993-11-01), None
patent: 06-91138 (1994-04-01), None
patent: 6-91138 (1994-04-01), None
patent: 8-24576 (1996-01-01), None
patent: 8-266629 (1996-10-01), None
patent: 08-266854 (1996-10-01), None
patent: 8-266854 (1996-10-01), None
patent: 10-137530 (1998-08-01), None
patent: 2001-159309 (2001-06-01), None
patent: 2001-159309 (2001-06-01), None
patent: 2001-179040 (2001-07-01), None
patent: 2001-179040 (2001-07-01), None
patent: 2002-336653 (2002-11-01), None
patent: 2002-336653 (2002-11-01), None
patent: WO 98/02233 (1998-01-01), None
patent: WO 99/38603 (1999-08-01), None
patent: WO 03/078958 (2003-09-01), None
patent: WO 2004/014439 (2004-02-01), None
Database WPI Week 200156, Derwent Publications Ltd., London, GB; AN 2001-505792, XP002427901.
Yamamoto T. et al, “Catalysis-assisted plasma technology for carbon tetrachloride destruction”, Industry Applications Society Annual Meeting, 1994, Conference Record of the 1994 IEEE Denver, CO, USA Oct. 2-6, 1994, New York, NY, USA, IEEE, Oct. 2, 1994, pp. 1556-1562.
Y. Maeda, “Outline and Performance of Plasma Deodorizer”, Takuma Giho, vol. 5, No. 1, pp. 66-71, 1997, abstract.
Iida Akemitsu
Mizuno Akira
Nittetsu Mining Co., Ltd.
Sughrue & Mion, PLLC
Vanoy Timothy C.
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