Gas processing method and gas processing apparatus utilizing...

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture

Reexamination Certificate

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Details

C422S004000, C422S005000, C422S028000, C422S168000, C422S177000, C422S180000, C422S186040, C422S186180, C204S164000

Reexamination Certificate

active

07347979

ABSTRACT:
A method for treating a gas characterized in that a low temperature plasma is generated in the presence of a metallic oxide oxidation catalyst, and an apparatus for treating a gas characterized by containing a low temperature plasma-generating unit carrying a metallic oxide oxidation catalyst are disclosed. According to the treating method and the treating apparatus, harmful components (such as carbon monoxide or a volatile organic compound) in a gas to be treated can be efficiently oxidized and rendered harmless, a foul odor may be rendered odorless, and further, microorganisms may be removed from and reduced in the treated gas.

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