Fluid handling – Line condition change responsive valves – With separate connected fluid reactor surface
Patent
1999-05-18
2000-12-12
Hepperle, Stephen
Fluid handling
Line condition change responsive valves
With separate connected fluid reactor surface
137507, 137557, G05D 1602
Patent
active
061584576
ABSTRACT:
A gas pressure reduction apparatus has a high pressure inlet port and low pressure outlet port. A spring-biased piston is operatively interposed between the inlet and outlet ports. The apparatus includes a metal part with a high pressure passage communicating the inlet port with the piston. The high pressure passage has a portion with a relatively constricted flow area, whereby compression of gas flowing through the passage yields heat of compression that heats the metal part. The apparatus further includes a plastic part configured to engage and support the metal part in an operative position in which the inlet port communicates with an outlet port on a pressure vessel outlet valve.
REFERENCES:
patent: 1827266 (1931-10-01), Shipley
patent: 1890357 (1932-12-01), Barber
patent: 3269411 (1966-08-01), Teston
patent: 3342205 (1967-09-01), Quinto
patent: 3520325 (1970-07-01), Stuart
patent: 3699998 (1972-10-01), Baranowski, Jr.
patent: 3762439 (1973-10-01), Heath
patent: 3848631 (1974-11-01), Fallon
patent: 3926208 (1975-12-01), Hoffman et al.
patent: 3949966 (1976-04-01), Fabish
patent: 4015630 (1977-04-01), Contreras
patent: 4655246 (1987-04-01), Phlipot et al.
patent: 5135023 (1992-08-01), Ross
patent: 5413096 (1995-05-01), Hart
patent: 5509407 (1996-04-01), Schuler
patent: 5760301 (1998-06-01), Shuman, Jr.
A drawing entitled "Prior Art Design (Ref Patent No. US 5760301)" dated Jan. 28, 2000.
Drawing No. RP30580B entitled "MIG Regulator Argon, 30 CFH Flow, Bulk" Feb. 25, 1998.
Bosnik Douglas A.
Byrd Douglas S.
Crampton Byron A.
Greene David R.
Hepperle Stephen
Western/Scott Fetzer Company
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