Gas polishing method

Details Gas polishing method Gas polishing method

1998-02-26

2000-10-24

Gupta, Yogendra

Etching a substrate: processes

Gas phase etching of substrate

216 67, 20429833, 156345, 438706, 438710, C23F 102, C23F 124, C03C 2568

Patent

active

061362131

ABSTRACT:
Etching of an object is achieved by jetting etching gas onto the object from a gas jetting nozzle. A gas jetting pipe for jetting the etching gas and a discharge pipe for discharging the jetted gas are designed as a coaxial dual pipe structure. The etching gas is jetted from the gas jetting pipe toward the object and, at the same time, excess etching gas is discharged through the discharge pipe.

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