Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent
1992-12-11
1995-04-11
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With microwave gas energizing means
156626, 156643, 156646, 118712, 118722, B23K 2600
Patent
active
054054818
ABSTRACT:
Gas photonanograph for the production and optical analysis of nanometer scale patterns. The photonanograph has a gas expansion chamber equipped with a gas supply for producing patterns and provided at a first end with microcapillaries for the discharge of the gas, an optical fibre, which is sharp at a first end and which is to be positioned facing the sample to be treated, a light source coupled to the second end of the optical fibre, the latter being transparent to the light emitted by the light source, and detecting and processing apparatus for monitoring a light signal reflected by the sample. The photonanograph permits the localized etching or deposition of materials for microelectronics or microoptoelectronics.
REFERENCES:
patent: 4564736 (1986-01-01), Jones et al.
patent: 4611919 (1986-09-01), Brooks, Jr. et al.
patent: 4930439 (1990-06-01), Sato et al.
patent: 4960495 (1990-10-01), Mori et al.
patent: 4964940 (1990-10-01), Auvert et al.
patent: 5062364 (1991-11-01), Lewis et al.
Bensoussan Marcel
Licoppe Christian
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