Gas photonanograph for producing and optically analyzing nanomet

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means

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Details

156626, 156643, 156646, 118712, 118722, B23K 2600

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active

054054818

ABSTRACT:
Gas photonanograph for the production and optical analysis of nanometer scale patterns. The photonanograph has a gas expansion chamber equipped with a gas supply for producing patterns and provided at a first end with microcapillaries for the discharge of the gas, an optical fibre, which is sharp at a first end and which is to be positioned facing the sample to be treated, a light source coupled to the second end of the optical fibre, the latter being transparent to the light emitted by the light source, and detecting and processing apparatus for monitoring a light signal reflected by the sample. The photonanograph permits the localized etching or deposition of materials for microelectronics or microoptoelectronics.

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patent: 4930439 (1990-06-01), Sato et al.
patent: 4960495 (1990-10-01), Mori et al.
patent: 4964940 (1990-10-01), Auvert et al.
patent: 5062364 (1991-11-01), Lewis et al.

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