Gas phase process for the production of 1,1-dichloro-1-fluoroeth

Organic compounds -- part of the class 532-570 series – Organic compounds – Halogen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

570166, 570167, 570168, C07C 1708

Patent

active

054498422

ABSTRACT:
A novel gas phase process for the production of 1,1-dichloro-1-fluoroethane from vinylidene chloride and hydrogen fluoride is provided. The process is characterized by high conversion of vinylidene chloride to product, with a high selectivity for 1,1-dichloro-1-fluoroethane. The process may also be operated to selectively form 1-chloro-1,1-difluoroethane. Few volatile by-products and substantially no tar or oligomeric material is formed. Catalyst performance remains constant over extended periods of time.

REFERENCES:
patent: 2637747 (1953-05-01), McBee
patent: 3755477 (1973-08-01), Firth et al.
patent: 3803241 (1974-08-01), Stolkin et al.
patent: 3836479 (1974-09-01), Paucksch et al.
patent: 3904701 (1975-09-01), Schultz et al.
patent: 4147733 (1979-04-01), Fiske et al.
patent: 4258225 (1981-03-01), Feiring
patent: 4374289 (1983-02-01), Van Der Puy et al.
patent: 4766259 (1988-08-01), Manzer et al.
patent: 5051538 (1991-09-01), Gumprecht
Feiring, J. Fluorine Chem. 14, 7-18 (1979).
Henne et al., J. Am. Chem. Soc. 65, 1271 (1943).
Henne et al., J. Am. Chem. Soc. 70:758 (1945).
McBee et al. Ind. Eng. Chem. 39 409-12 (1947).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas phase process for the production of 1,1-dichloro-1-fluoroeth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas phase process for the production of 1,1-dichloro-1-fluoroeth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas phase process for the production of 1,1-dichloro-1-fluoroeth will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-406748

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.