Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1992-11-25
1994-07-26
Kunemund, Robert
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 2, 252 791, 2521811, 252372, 156643, 156646, 437946, H01L 21306, B08B 500, C09K 1300
Patent
active
053324447
ABSTRACT:
This invention is a vapor-phase process for cleaning metal-containing contaminants from the surfaces of integrated circuits and semiconductors between the numerous fabricating steps required to manufacture the finished electronic devices. The process employs cleaning agents comprising an effective amount of hexamethyldisilazane. The process comprises contacting the surface to be cleaned with an effective amount of the desired cleaning agent at a temperature sufficient to form volatile metal-ligand complexes on the surface of the substrate to be cleaned. The volatile metal-ligand complexes are sublimed from the surfaces of the substrate providing a clean, substantially residue-free surface.
REFERENCES:
patent: 4592926 (1986-06-01), Rubin et al.
patent: 5094701 (1992-03-01), Norman et al.
T. Ito and coworkers, Proc. 2nd Int'l. Symp. on Cleaning Technol. In Semicond. Dev. Manuf., 92-12, pp. 72-76, (1992).
Bohling David A.
George Mark A.
Air Products and Chemicals Inc.
Gourley Keith D.
Kunemund Robert
Marsh William F.
Ojan Ourmazd S.
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