Gas panel

Details Gas panel Gas panel

1996-10-30

1999-11-30

Fox, John

Fluid handling

Systems

With flow control means for branched passages

137240, F16K 1120

Patent

active

059924632

ABSTRACT:
A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

REFERENCES:
patent: 5368062 (1994-11-01), Ohumura et al.
patent: 5605179 (1997-02-01), Strong, Jr. et al.
patent: 5730181 (1998-03-01), Doyle et al.
patent: 5769110 (1998-06-01), Ohmi et al.
patent: 5803507 (1998-09-01), Vu
CKD Corporation Brochure, "Integrated Valves and MFC With Metal Seal Rings", 5 pages, undated.

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