Gas measuring device and processing apparatus provided with the

Details Gas measuring device and processing apparatus provided with the Gas measuring device and processing apparatus provided with the

1992-06-26

1994-03-15

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With microwave gas energizing means

156626, 156627, 118712, 118715, 118724, 20429803, 20429832, H01L 2100

Patent

active

052942805

ABSTRACT:
A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.

REFERENCES:
patent: 4013943 (1977-03-01), Chou et al.
patent: 4267023 (1981-05-01), Frant et al.
patent: 4326200 (1982-04-01), Bushman
patent: 4994158 (1991-02-01), Kiimalainen et al.
patent: 5153139 (1992-10-01), Volz-Thomas et al.

Affiliated with

Also associated with

Rating

Gas measuring device and processing apparatus provided with the does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas measuring device and processing apparatus provided with the , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas measuring device and processing apparatus provided with the will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1533409