Gas mask filter for the removal of low level ethylene oxide cont

Details Gas mask filter for the removal of low level ethylene oxide cont Gas mask filter for the removal of low level ethylene oxide cont

1987-05-18

1989-03-21

Cohan, Alan

Surgery

Respiratory method or device

Means for removing substance from respiratory gas

55522, 4232451, A62B 1800

Patent

active

048134104

ABSTRACT:
A gas mask filter material is described comprising a dried acidic ion exchange resin which is effective in removing low levels of ethylene oxide from air contaminated therewith. Specifically described is a gas mask filter comprising a cross-linked polystyrene resin with sulfonic acid functionality that contains less than about 20 percent by weight water.

REFERENCES:
patent: 3851043 (1974-11-01), Gunther
patent: 4365071 (1982-12-01), Yamanes
patent: 4383956 (1983-05-01), Croft
patent: 4423005 (1983-12-01), Murtaugh
patent: 4572178 (1986-02-01), Takase

Affiliated with

Also associated with

Rating

Gas mask filter for the removal of low level ethylene oxide cont does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas mask filter for the removal of low level ethylene oxide cont, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas mask filter for the removal of low level ethylene oxide cont will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-470673