Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1989-12-22
1993-08-24
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204186, 210222, 96 3, B01D 1900
Patent
active
052385477
ABSTRACT:
A gas-liquid separation method for electroconductive gas-liquid two phase flow and the device therefor wherein electrodes are disposed in the vicinity of inlet and outlet portions of the gas-liquid separation region in the flow passage of electroconductive gas-liquid two phase flow so as to flow an electric current thereto. A magnet is disposed in the gas-liquid separation region of the flow passage so as to generate a magnetic field perpendicular to the current and to generate an electromagnetic force acting along the flow passage wall on the electroconductive liquid by taking advantage of the Flemming's left hand law, thereby separating the electroconductive gas-liquid two phase flow into gas phase and liquid phase. A hydrophobic porous material having water permeability is employed as the flow passage wall in the gas-liquid separation region; the gas-liquid separation region is disposed in a reduced pressure region; and the separated gas phase is effectively removed out of the flow passage.
REFERENCES:
patent: 3349354 (1967-10-01), Miyata
patent: 3466154 (1969-09-01), Hori et al.
patent: 3719583 (1973-03-01), Ustick
patent: 4704139 (1987-11-01), Yamamoto et al.
patent: 4747925 (1988-05-01), Hasebe et al.
Hamano Nobuo
Okusawa Tsutomu
Tsubouchi Kuniyoshi
Hitachi , Ltd.
Leader William T.
Niebling John
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