Gas and liquid contact apparatus – Fluid distribution – Valved
Reexamination Certificate
2011-05-31
2011-05-31
Bushey, Scott (Department: 1776)
Gas and liquid contact apparatus
Fluid distribution
Valved
C261S065000, C261S078200, C261S089000
Reexamination Certificate
active
07950630
ABSTRACT:
This invention relates to a gas-liquid mixing device, forming a safety valve, designed capable of being incorporated into a gas-cleaning installation including a liquid tank (4), an inlet (1) for gas to be cleaned and an outlet (7) through which the gas flow is evacuated. It is characterized in that it has:a tube (2) sliding around the gas inlet (1) and including a peripheral float (8) located in its lower end and designed capable of floating in said tank (4), said sliding tube (2) being open in its lower portion, in order to draw liquid from said tank (4) by a venturi effect and to create a mist in a pressure-relief zone (5);a mixing chamber (6) interposed between said sliding tube (2) and said outlet (7), and designed capable of conveying the flow of said mist towards the bottom of said tank (4).
REFERENCES:
patent: 2229083 (1941-01-01), Hansen et al.
patent: 4055405 (1977-10-01), Thun-Hohenstein
patent: 4251241 (1981-02-01), Bothun
patent: 4874404 (1989-10-01), Boswell
patent: 5192344 (1993-03-01), House
patent: 5520714 (1996-05-01), Muschelknautz
patent: 5752997 (1998-05-01), Roth
patent: 5776215 (1998-07-01), Amoretti
patent: 5820657 (1998-10-01), Driker et al.
patent: 6814788 (2004-11-01), Barazza et al.
patent: 0768058 (1997-04-01), None
patent: 0897740 (1999-02-01), None
French Search Report No. 0604955, dated Jan. 23, 2007.
Bushey Scott
Westerman Hattori Daniels & Adrian LLP
WINDDROP
LandOfFree
Gas-liquid mixing device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas-liquid mixing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas-liquid mixing device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2696703