Gas lift chamber purge and vent valve and pump systems

Details Gas lift chamber purge and vent valve and pump systems Gas lift chamber purge and vent valve and pump systems

2006-03-31

2010-02-09

Thompson, Kenneth (Department: 3672)

Wells

Processes

Producing the well

C166S375000, C166S322000, C417S115000, C417S054000, C137S155000

Reexamination Certificate

active

07658229

ABSTRACT:
The present invention is directed to producing fluid from an oil or gas well by means of a combination intermittently filled down hole chamber accumulation device and a connected upper continuous gas lift flow system, separated by an inline one-way reverse flow check valve. A two-way purge and vent valve controls the distribution of high pressure gas. The two-way valve first injects high pressure gas into the chamber accumulation device to displace the fluid from the chamber into the continuous flow conduit. The two-way valve then vents the residual high pressure gas from the chamber into a separate low pressure conduit to the surface. The valve also provides high pressure gas to the continuous flow conduit to assist in the production of the fluid.

REFERENCES:
patent: 3225783 (1965-12-01), Stacha
patent: 3617152 (1971-11-01), Cummings
patent: 4791990 (1988-12-01), Amani
patent: 5066198 (1991-11-01), Decker
patent: 5458200 (1995-10-01), Lagerlef et al.
patent: 5782261 (1998-07-01), Becker et al.
patent: 5806598 (1998-09-01), Amani
patent: 6904893 (2005-06-01), Hotta et al.
patent: 6973973 (2005-12-01), Howard et al.
International Search Report, dated Oct. 22, 2007, for application No. PCT/US 07/64701.
Written Opinion of the International Searching Authority, dated Oct. 22, 2007, for application No. PCT/US 07/64701.

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