Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...
Patent
1997-07-21
2000-08-22
Stinson, Frankie L.
Cleaning and liquid contact with solids
Apparatus
With plural means for supplying or applying different fluids...
134105, 134110, 134200, 134902, B08B 1502
Patent
active
061055921
ABSTRACT:
An apparatus for processing a semiconductor wafer is set forth. The apparatus comprises a processing bowl that defines a processing chamber. The bowl has an opening through which wafers may be placed in the apparatus. A wafer support structure adapted to support at least one wafer is mounted for rotation within the processing chamber. A motor drive assembly is connected to rotate the wafer support structure. At least one fluid nozzle accepts processing fluid and sprays the processing fluid on the one or more wafers carried by the wafer support structure. A door is used to seal the opening of the processing bowl. The door has an opening that is open to ambient atmosphere to facilitate passage of ambient gas into the processing chamber. An ambient gas intake assembly is disposed in the door. The ambient gas intake assembly comprises a high efficiency filter, preferably, and ULPA filter, disposed to filter ambient gas passing from the opening of the door to the processing chamber and a heater disposed to heat the filtered gas prior to entering the processing chamber.
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Bexten Daniel P.
Owczarz Aleksander
Thompson Raymon F.
Semitool Inc.
Stinson Frankie L.
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