Gas inlet for a plurality of reactant gases into reaction vessel

Details Gas inlet for a plurality of reactant gases into reaction vessel Gas inlet for a plurality of reactant gases into reaction vessel

1994-03-29

1995-08-15

Warden, Robert J.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Soap making

239400, 239428, 239432, B05B 700, B05B 704

Patent

active

054417031

ABSTRACT:
A gas inlet for different reactant gases which flow into reaction vessels with high flow velocity. The cross sections of the gas inlet supply lines are substantially smaller than that of the reaction vessel.
The gas inlet has a part with a conicoidal interior contour, the cross section of which is adapted to the cross section of the reaction vessel and which is arranged at one end of the reaction vessel through which flow occurs. The individual supply lines end at approximately the focal point of the part having the conicoidal interior contour. The gas exit openings of the supply lines are directed at the vertex of the part having the conicoidal interior contour.

REFERENCES:
patent: 598630 (1898-02-01), Iler
patent: 2205336 (1940-06-01), Beach
patent: 4002432 (1977-01-01), Brice
patent: 4141701 (1979-02-01), Ewan et al.
Capron, B. A., Herring, R. B., "Silicon Nitride Deposition in a Vertical Flow Reactor," Extended Abstracts, Oct. 1984, p. 738.
Gallagher, J. P., Li, P. C., "Gas Injector for Nitride Deposition Using 2% Silane Gas," IBM Technical Disclosure Bulletin, Dec. 1983.
Perry & Chilton, Chemical Engineer's Handbook, 5th Ed. pp. 18-61-18-62.

Affiliated with

Also associated with

Rating

Gas inlet for a plurality of reactant gases into reaction vessel does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas inlet for a plurality of reactant gases into reaction vessel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas inlet for a plurality of reactant gases into reaction vessel will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2180024