Gas injection system for CVD reactors

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118715, 118725, 156345, C23C 1600

Patent

active

06113984&

ABSTRACT:
A CVD reactor includes separate reaction and pressure chambers, where the reaction chamber is contained within and isolates process or reactant gases from the pressure chamber. The reactor also includes a gas injection system which pre-heats and injects diffused process gas(es) into the reaction chamber in a somewhat vertical direction through a bottom surface of the reaction chamber. The gas injection system injects hydrogen or other appropriate gas in a vertical direction through the bottom surface of the reaction chamber. The flow of hydrogen or other appropriate gas is intermediate the flow of the process gas(es) and a surface of the reaction chamber, thereby re-directing the process gas flow parallel to the top surface of a wafer therein. In this manner, the reaction chamber does not require a long entry length for the process gas(es). This flow of hydrogen or other suitable gas also minimizes undesirable deposition on the surface of the reaction chamber.

REFERENCES:
patent: 4699805 (1987-10-01), Seelbach et al.
patent: 4924807 (1990-05-01), Nakayama et al.
patent: 5062386 (1991-11-01), Christensen
patent: 5238499 (1993-08-01), Van de Ven et al.
patent: 5264040 (1993-11-01), Geyling
patent: 5269847 (1993-12-01), Anderson et al.
patent: 5370738 (1994-12-01), Watanabe et al.
patent: 5516367 (1996-05-01), Lei et al.
patent: 5551982 (1996-09-01), Anderson et al.
patent: 5653808 (1997-08-01), MacLeish et al.
patent: 5843233 (1998-12-01), Van de Ven et al.
patent: 5882417 (1999-03-01), Van de Ven et al.
patent: 5891251 (1999-04-01), MacLeish et al.
patent: 5916369 (1999-06-01), Anderson et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas injection system for CVD reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas injection system for CVD reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas injection system for CVD reactors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2209673

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.