Gas injection apparatus and method

Details Gas injection apparatus and method Gas injection apparatus and method

1991-07-25

1992-11-03

Miles, Tim

Gas and liquid contact apparatus

Contact devices

Injector type

261DIG75, B01F 304

Patent

active

051604582

ABSTRACT:
The present invention provides a gas injection apparatus for dissolving a gas in a flowing liquid. The apparatus comprises a conduit having a passageway through which flowing liquid flows. An injection pipe in communication with the passageway is provided for injecting gas into the flowing liquid so that a plurality of undissolved gas bubbles are produced within the flowing liquid. Preferably, the passageway has a pair of opposed centrally located side pocket regions for dividing the flowing liquid into a main flow region flowing in the predominant direction of flow of the liquid and two circulating side flow region situated along side the main flow region and within which the gas dissolves. The gas dissolved in the side flow regions produces a concentration gradient driving the gas from the side flow regions into the main flow region for discharge out of an outlet of the conduit.

REFERENCES:
patent: 543411 (1895-07-01), Taylor
patent: 2762202 (1956-09-01), Ponsar
patent: 3446488 (1969-05-01), Mail et al.
patent: 3655343 (1972-04-01), Galeano
patent: 3826742 (1974-07-01), Kirk et al.
patent: 3928199 (1975-12-01), Kirk et al.
patent: 4138330 (1979-02-01), Garrett
patent: 4162971 (1979-07-01), Zlokamik et al.
patent: 4562014 (1985-12-01), Johnson
patent: 4834343 (1989-05-01), Boyes
patent: 4907305 (1990-03-01), Teramachi et al.

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