Gas and liquid contact apparatus – Contact devices – Rotating
Patent
1996-11-15
1998-01-27
Miles, Tim R.
Gas and liquid contact apparatus
Contact devices
Rotating
261 93, B01F 304
Patent
active
057119023
ABSTRACT:
Disclosed is a gas-induced reactor which mainly includes a tank body without inner baffles and a draft tube with inner baffles mounted in the tank body. An upper and a lower turbines are installed in series on a shaft of said tank body and enclosed by the draft tube. The turbines each have six 45.degree. pitched, rectangular, flat blades. When the two turbines rotate at high speed to agitate gas and liquid in the draft tube, a downward regular gas vortex is formed at a center of liquid surface in the tank body above the draft tube. The regular gas vortex is pulled inward to the draft tube and is disturbed by the baffles in the draft tube to become an irregular gas vortex in the draft tube. The irregular gas vortex is broken by the rotating turbines into bubbles which are angularly distributed out of the draft tube and into liquid in the tank body. The gas vortex formed by the rotating turbines in the draft tube create a gas-induction phenomenon which may increase the length of gas flow paths and the numbers of gas circulation in the tank body by inducing gas escaped from the liquid surface back into the liquid. The gas utilization ratio is therefore largely increased in the gas-induced reactor.
REFERENCES:
patent: Re32562 (1987-12-01), Litz
patent: 4699740 (1987-10-01), Bollenrath
patent: 4750994 (1988-06-01), Schneider
patent: 4798131 (1989-01-01), Ohta et al.
patent: 5084252 (1992-01-01), Cahill et al.
patent: 5102630 (1992-04-01), Lee
patent: 5314076 (1994-05-01), La Place et al.
patent: 5451348 (1995-09-01), Kingsley
LandOfFree
Gas-induced reactor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas-induced reactor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas-induced reactor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-339328