Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1981-05-18
1984-01-10
Valentine, Donald R.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204273, 204278, 204284, 204289, C25B 900, C25B 1103, C25B 1508
Patent
active
044252161
ABSTRACT:
The invention relates to devices employed for generation of oxygen-hydrogen gas. Efficient production of gas is achieved by an electrode assembly (18) placed within a chamber assembly (17) the input end of which is elevated above the output end. Electrodes (38) having surfaces (41) with ribs (57) form narrowing, deepening channels (56) down which electrolyte flows in a turbulent manner.
REFERENCES:
patent: 525304 (1894-08-01), Woods
patent: 823650 (1906-06-01), Vareille
patent: 922134 (1909-05-01), Goucher
patent: 1145862 (1915-07-01), Goucher
patent: 1398658 (1921-11-01), Vincent
patent: 1588214 (1926-06-01), Walsh
patent: 1600478 (1926-09-01), Lawaczeck
patent: 2876862 (1959-03-01), Hummell
patent: 3216911 (1965-11-01), Kronenberg
patent: 3222269 (1965-12-01), Stanton
patent: 3273666 (1966-09-01), Hamilton et al.
patent: 3379634 (1968-04-01), Rutkowski
patent: 3523834 (1970-08-01), Hewins
patent: 3650935 (1972-03-01), Andersson
patent: 3753889 (1973-08-01), Eisner
patent: 3767542 (1973-10-01), Carlson
patent: 3790465 (1974-02-01), Giacopelli et al.
patent: 3925212 (1975-12-01), Tchernev
patent: 3930151 (1975-12-01), Shibata et al.
patent: 3957618 (1976-05-01), Spirig
patent: 3972792 (1976-08-01), Laxen
patent: 4090927 (1978-05-01), Fresnel et al.
patent: 4113601 (1978-09-01), Spirig
patent: 4139429 (1979-02-01), Steward et al.
patent: 4140616 (1979-02-01), Wheatley et al.
patent: 4181591 (1980-01-01), King
LandOfFree
Gas generation apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas generation apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas generation apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-452609