Gas flushing system with recovery system for use in...

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

Reexamination Certificate

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C250S492220, C355S030000, C355S053000, C355S055000

Reexamination Certificate

active

06987278

ABSTRACT:
In a lithographic apparatus using exposure radiation of a relatively short wavelength, e.g. 157 or 126 nm, a laminar flow of N2is provided across parts of the beam path in or adjacent to moving components of the apparatus. The laminar flow is faster than the maximum speed of the moving components and the diffusion rate of air thereby minimizing the contamination of the N2by mixing with air. Laminar flow may be ensured by providing partitions to divide the beam path into separate spaces, by covering rough or non-planar surfaces in components on or adjacent to the laminar flow and by providing aerodynamic members.

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patent: WO 99/25010 (1999-05-01), None

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