Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent
1988-12-20
1990-08-21
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Multizone chamber
118729, 118733, 4272481, 4272555, C23C 1600
Patent
active
049496697
ABSTRACT:
Gas flow structures are described for the inputting and exhausting of gases for a continuous vapor deposition reactor to cause an even flow of gases within the reactor chamber and to prevent the deposition of reaction material on the walls of the reactor chamber. Gas inlet and exhaust port structures are provided for multiple-chamber chemical vapor deposition reactors having gas input and exhaust junctions, wherein the ports may include, in order to provide uniform flow, baffles or a plurality of orifices with or without shutters. Two vertically spaced gas inlets may be used, wherein gas from a second inlet prevents deposition on the reactor chamber from gases introduced through the first inlet.
REFERENCES:
patent: 3338209 (1967-08-01), Bhola
patent: 3441454 (1969-04-01), Shaikh
patent: 3517643 (1970-06-01), Goldstein et al.
patent: 3598082 (1971-08-01), Rice
patent: 3623712 (1971-11-01), McNeilly et al.
patent: 4047496 (1977-09-01), McNeilly et al.
patent: 4048955 (1977-09-01), Anderson
patent: 4081313 (1978-03-01), McNeilly et al.
patent: 4430149 (1984-02-01), Berkman
patent: 4792378 (1988-12-01), Rose et al.
patent: 4820371 (1989-04-01), Rose
Viva, O. R., "Obtaining Improved Gas Flow in Diffusion Apparatus", IBM Technical Disclosure Bulletin, vol. 14, No. 9 (Feb. 1972), p. 2550.
Ishii Kaoru
Wilkinson Thomas F.
Bueker Richard
Honeycutt Gary C
Merrett Rhys
Owens Terry J.
Sharp Melvin
LandOfFree
Gas flow systems in CCVD reactors does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas flow systems in CCVD reactors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas flow systems in CCVD reactors will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1669760