Measuring and testing – Volume or rate of flow – Using differential pressure
Patent
1978-04-05
1984-11-27
Yasich, Daniel M.
Measuring and testing
Volume or rate of flow
Using differential pressure
73730, 361285, G01L 912, G01F 138
Patent
active
044844794
ABSTRACT:
Gas flow metering using a capacitance measurement and comprising a taut elastomeric membrane, preferably tubular in form, which expands or contracts as a function of flow rate past it to an extent determined by Bernouilli's principle. The thus changing distance between this membrane and one or more external electrodes measured by capacitance change or other means is correlatable with the instantaneous flow rate and such measurement can be made essentially without regard to entrained solids or liquids in the gas flow, phase and temperature changes (moderate) within the gas flow or mixture or changing composition therein and with rapid response and low back pressure.
REFERENCES:
patent: 1939067 (1933-12-01), Legg
patent: 2127501 (1938-08-01), Dall
patent: 2522574 (1950-09-01), Hagenbuch
patent: 2538785 (1951-01-01), Karig
patent: 2915078 (1959-12-01), Ochs, Jr.
patent: 2976720 (1961-03-01), Callahan
patent: 2987915 (1961-06-01), Hildenbrandt, Jr.
patent: 3130586 (1964-04-01), Taylor et al.
patent: 3148314 (1964-09-01), Ponemon
patent: 3163529 (1964-12-01), Jewett
patent: 3240207 (1966-03-01), Barker et al.
patent: 3352157 (1967-11-01), Seegmiller
patent: 3385112 (1968-05-01), Pruitt et al.
patent: 3563095 (1971-02-01), Robinson, Jr.
patent: 3618390 (1971-11-01), Frick
patent: 3724503 (1973-04-01), Cooke
patent: 3802265 (1974-04-01), Wood
patent: 4012939 (1977-03-01), Hayward
patent: 4091683 (1978-05-01), Delatorre
Cohen Jerry
Yasich Daniel M.
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