Gas flow distribution system

Details Gas flow distribution system Gas flow distribution system

1990-11-26

1991-11-19

Fox, John C.

Fluid handling

Systems

With flow control means for branched passages

137599, F16K 1110

Patent

active

050657941

ABSTRACT:
Gas distribution system including main, lateral and loop conduits in which gas flow is continuously provided between a source of pressurized gas and venting means so that "dead space" is avoided in the distribution system and continuous real time monitoring of system gas is enabled.

REFERENCES:
patent: 3464447 (1969-09-01), Jones
patent: 4714091 (1987-12-01), Wagner
"Ultra Clean Gas Delivery System", K. R. Grosser, Technical Proceeding Semicon/East Sep., 1989, pp. 7-15.
"Examining Performance of Ultra-High-Purity Gas, Water, and Chemical Delivery Subsystems", Tadahiro Ohim, et al., Microcontamination, Mar., 1990, pp 27-33 and pp. 60, 62 and 63.
"Design and Performance of the Bulk Gas Distribution System in The Advanced Semiconductor Technology Center (ASTC)", Bradley Todd, et al., Proceedings, Microcontamination, Oct., 1989, pp. 1-17.
"Installing and Certifying Sematech's Bulk Gas Delivery Systems", T. F. Fisher et al., Microcontamination, May, 1990, pp. 23-33.

Affiliated with

Also associated with

Rating

Gas flow distribution system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas flow distribution system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas flow distribution system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1363677