Gas film wafer transportation system

Conveyors: fluid current – With means to control conveying fluid or movement of load in...

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406 52, 406 73, 406 84, 406 88, B65G 5102

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active

043481396

ABSTRACT:
A manufacturing processing system comprises a plurality of processing stations, preferably vacuum stations, interconnected by air track, preferably an axi-radial air track with novel sections rotatable about a transverse axis in the plane of the track and normal to the travel of the objects, hereafter referred to as swivelators. Certain of the swivelators are formed with axial movable portions capable of moving beyond the plane of the air track surface and returning to the plane, so that these swivelators can pick up and set down objects in predetermined positions in the manufacturing processing station with an air force so as to not make physical contact with the objects. A novel gas lock device is positioned in the air track between those processing stations, in which the gas pressure must be separated so as to essentially eliminate the possibility of gas contaminant passing from one station to the next. The gas lock comprises an air track compartment having closable sides or panels in the path of the travel of the object being transported along the air track.

REFERENCES:
patent: 3588176 (1971-06-01), Byrne et al.
patent: 3622151 (1971-11-01), Range et al.
patent: 3812947 (1974-05-01), Nygaard
patent: 3976330 (1976-08-01), Babinski et al.
patent: 4014428 (1977-03-01), Ossbahr
patent: 4081201 (1978-03-01), Hassan et al.
patent: 4165132 (1979-08-01), Hassan et al.
IBM Technical Disclosure Bulletin; vol. 11, No. 7; pp. 757-758; Dec. 1968; "Two Chamber Air to Vacuum Lock System"; by Barber.
Solid State Technology; Apr. 1980; pp. 148-155; "A New Air Film Technique for Low Contact Handling of Silcon Wafers", by Paivanas & Hassan.

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