Gas feeding device for controlled vaporization of an organometal

Details Gas feeding device for controlled vaporization of an organometal Gas feeding device for controlled vaporization of an organometal

1995-05-11

1998-05-26

Beck, Shrive

Coating apparatus

Gas or vapor deposition

118726, 261 81, C23C 1654

Patent

active

057558850

ABSTRACT:
A gas-feeding device for feeding a starting gas for forming a deposited film by the chemical vapor deposition method, comprising a storage area for an organometallic compound having a high viscosity, wherein the storage area has a space for discharging a starting gas containing the organometallic compound by introducing a carrier gas into the storage area. The carrier gas is introduced into the organometallic gas via a gas-introducing member having a number of openings. An ultrasonic oscillator is provided in the storage area to generate cavitation in the organometallic compound. A deposited-film forming apparatus incorporating the gas-feeding device is also described.

REFERENCES:
patent: 3840391 (1974-10-01), Spitz et al.
patent: 4076617 (1978-02-01), Bybel et al.

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