Gas feeding device for controlled vaporization of an organometal

Details Gas feeding device for controlled vaporization of an organometal Gas feeding device for controlled vaporization of an organometal

1994-04-21

1995-12-19

Owens, Terry J.

Coating apparatus

Gas or vapor deposition

Crucible or evaporator structure

261124, C23C 1652

Patent

active

054765471

ABSTRACT:
A gas feeding device for feeding to a reaction vessel a starting gas for film formation by chemical vapor deposition. The gas feeding device is connected to a container which contains an organometallic compound, and has a plurality of gas introducing openings for introducing a carrier gas into the container for carrying vaporized organometallic compound into the reaction vessel. The gas feeding device includes an accelerating device which selects a carrier gas introducing route into the container through at least one of the plurality of gas introducing openings for accelerating the generation of the starting gas.

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