Gas exhaust system and pump cleaning system for a semiconductor

Details Gas exhaust system and pump cleaning system for a semiconductor Gas exhaust system and pump cleaning system for a semiconductor

1994-03-15

1995-08-22

Breneman, R. Bruce

Coating apparatus

Gas or vapor deposition

4182011, 134169R, C23C 1600, F01C 116, B08B 300

Patent

active

054436443

ABSTRACT:
A gas exhaust system for use in a semiconductor manufacturing process wherein mechanical or chemical processing is applied on silicon wafers or the like arranged in a air-tight process chamber thereof, comprises a vacuum chamber having a gas suction port formed on an upper side thereof and a gas exhaust port formed on a lower side thereof. In the vacuum chamber, the first and second rotors are arranged vertically and supported rotatably at their lower end port ions in a cantilevered condition. The first and second rotors are driven to rotate in the opposite directions to thereby form a certain degree of vacuum condition in the vacuum chamber, whereby the residual gasses in the process chamber are discharged therefrom through the gas exhaust system. Since the the rotors are supported in a cantilevered condition and the bearing mechanisms for the rotors are positioned apart from the suction port of the vacuum chamber, oil supplied to the bearing mechanism does not diffuse or leak into the side of the process chamber.

REFERENCES:
patent: 3182670 (1965-05-01), Howell
patent: 5011520 (1991-04-01), Carr
patent: 5158644 (1992-10-01), Cheung
patent: 5197861 (1993-03-01), Maruyama
patent: 5295798 (1994-03-01), Maruyama
patent: 5302089 (1994-04-01), Maruyama
patent: 5348448 (1994-09-01), Ikemoto
patent: 5352097 (1994-10-01), Itou

Affiliated with

Also associated with

Rating

Gas exhaust system and pump cleaning system for a semiconductor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas exhaust system and pump cleaning system for a semiconductor , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas exhaust system and pump cleaning system for a semiconductor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2138993