Gas exhaust apparatus

Details Gas exhaust apparatus Gas exhaust apparatus

1996-12-12

1998-06-02

Tran, Hien

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Including heat exchanger for reaction chamber or reactants...

422168, 422173, 422178, 422210, 165 95, F28G 108, F28G 116

Patent

active

057594988

ABSTRACT:
Improved gas exhaust apparatus of a semiconductor plant for substantially reducing the accumulation of solid substance on the surface of a gas exhaust system is disclosed. The apparatus includes a heating section for providing a thermal chamber, thereby transforming incoming gas and oxygen into solid substance. A barrier section is secured to an inner surface of the heating section for preventing the solid substance from accumulating on the inner surface of the heating section. A scrubbing section attached to the heating section is used to expel the solid substance out of the gas exhaust apparatus.

REFERENCES:
patent: 4372761 (1983-02-01), Lindroos
patent: 4521379 (1985-06-01), Beane
patent: 5649985 (1997-07-01), Imamura

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