Radiant energy – Photocells; circuits and apparatus – Optical or pre-photocell system
Patent
1976-01-08
1978-10-31
Edmundson, F.C.
Radiant energy
Photocells; circuits and apparatus
Optical or pre-photocell system
204164, 204176, 219121EB, 219121P, 250542, 250547, B01K 100, B23K 900
Patent
active
041236637
ABSTRACT:
A gas etching device comprises a vacuum vessel provided with a means for supplying into the vacuum vessel a gas containing therein oxygen atoms and a gas containing therein fluorine atoms, an etching gas-producing region provided within the vacuum vessel and provided with an exciting means for exciting said gases, and a reaction region provided within the vacuum vessel and disposed at a position spaced apart from the etching gas-producing region and having disposed therein a material to be etched. By the use of this device, etching can be performed with no deterioration of a resist, accordingly with success in fine fabrication, and with no damages to the material to be etched. Further, during the etching, the condition of the etching process can be watched with the naked eyes under illumination of natural light.
REFERENCES:
patent: 3410776 (1968-11-01), Bersin
patent: 3485591 (1969-12-01), Evans et al.
patent: 3616461 (1971-10-01), Gorin
patent: 3723290 (1973-03-01), Hamblyn et al.
patent: 3745751 (1973-07-01), Zey et al.
patent: 3775621 (1973-11-01), Gorin
patent: 3836786 (1974-09-01), Lowther
patent: 3879597 (1975-04-01), Bersin et al.
Edmundson F.C.
Tokyo Shibaura Electric Co. Ltd.
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