Gas distribution system for muffle-type furnaces

Coating apparatus – Gas or vapor deposition

Patent

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Details

2395533, 239557, 239560, 239568, C23C 1600

Patent

active

048096431

ABSTRACT:
A gas distribution system provides a gas to a chamber comprising a feed tube, having a tube-like configuration with an input and an output. The gas supplied to the input escapes via the output, the output being configured to have a first and second slot opening. The first slot opening has a predetermined first length along the length of the feed tube and has a predetermined first width across the length of the feed tube, and the second slot opening has a predetermined second length along the length of the feed tube and has a predetermined second width across the length of the feed tube. The second slot is contiguous with and abuts the first slot, and further the predetermined second width is smaller than the predetermined first width. The first and second slot configuration provides the gas at the output at a predetermined pressure, the predetermined pressure being reduced from an area near the output. A plenum, having a rectangular box-like configuration with a definable predetermined length and also having an opening corresponding in configuration to the output, receives the gas escaping from the output of the feed tube to temporarily contain the gas in a chamber formed by the plenum. The plenum further has a plurality of orifices such that the gas escaping from the orifices provides a predetermined spray pattern of the gas within the chamber along the length of the plenum, the length of the feed tube and the predetermined length of the plenum being parallel to each other.

REFERENCES:
patent: 424852 (1890-04-01), Bradley
patent: 2494243 (1950-01-01), Houlis
patent: 3156292 (1964-11-01), Ross

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