Gas distribution system and method for chemical vapor deposition

Details Gas distribution system and method for chemical vapor deposition Gas distribution system and method for chemical vapor deposition

1996-10-09

1998-12-29

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

118723E, 118712, C23C 1600

Patent

active

058534849

ABSTRACT:
A gas distribution system for a chemical vapor deposition (CVD) apparatus includes a main gas supply pipe for receiving gas from a gas supply, a manifold communicated to the main gas supply pipe and having a plurality of sub-pipes, a plurality of gas metering valves provided at each of the sub-pipes so as to control gas amount flowing therein from each of the sub-pipes, a gas distribution head communicating with each of the sub-pipes so as to collectively jet gas therefrom, a control unit for outputting control signals to each of the gas control valves, and an N-point scanner electrically connected to input terminals of the control unit. The gas distribution system improves deposition uniformity by adjusting the thickness of a film deposited on a wafer in accordance with scanning information from the N-point scanner.

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