Gas distribution system

Details Gas distribution system Gas distribution system

2005-07-26

2005-07-26

Zervigon, Rudy (Department: 1763)

Coating apparatus

Gas or vapor deposition

C118S728000, C156S345290, C156S345330, C156S345340, C156S345350, C156S345360

Reexamination Certificate

active

06921437

ABSTRACT:
The present invention provides a gas distribution apparatus useful in semiconductor manufacturing. The gas distribution apparatus comprises a unitary member and a gas distribution network formed within the unitary member for uniformly delivering a gas into a process region. The gas distribution network is formed of an inlet passage extending upwardly through the upper surface of the unitary member for connecting to a gas source, a plurality of first passages converged at a junction and connected with the inlet passage at the junction, a plurality of second passages connected with the plurality of first passages, and a plurality of outlet passages connected with the plurality of second passages for delivering the gas into a processing region. The first passages extend radially and outwardly from the junction to the periphery surface of the unitary member, and the second passages are non-perpendicular to the first passages and extend outwardly from the first passages to the periphery surface. The outlet passages extend downwardly through the lower surface of the unitary member for delivering the gas into the processing region.

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