Gas distribution plate with anodized alumnium coating

Details Gas distribution plate with anodized alumnium coating Gas distribution plate with anodized alumnium coating

2005-01-18

2005-01-18

Koehler, Robert R. (Department: 1775)

Stock material or miscellaneous articles

All metal or with adjacent metals

Having aperture or cut

C205S150000, C205S153000, C205S324000, C205S328000, C315S111210, C428S469000, C428S935000

Reexamination Certificate

active

06844082

ABSTRACT:
A new and improved, anodized aluminum gas distribution plate for process chambers, particularly an etch chamber. The gas distribution plate includes an aluminum body having multiple gas flow openings extending therethrough and an alumina anodized coating or layer on the plate. The gas distribution plate is characterized by enhanced longevity and durability and resists particle-forming deterioration and damage throughout prolonged use.

REFERENCES:
patent: 5939831 (1999-08-01), Fong et al.

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