Gas distribution arrangement for the admission of a processing g

Details Gas distribution arrangement for the admission of a processing g Gas distribution arrangement for the admission of a processing g

1985-02-26

1986-10-28

Peters, Jr., Joseph F.

Fluid sprinkling, spraying, and diffusing

Flow deflecting or rotation controlling means

239424, 2395905, 239593, 261 79A, 261 88, B01D 4716

Patent

active

046194045

ABSTRACT:
In a gas distribution arrangement the processing gas is admitted from a helical inlet duct through an annular orificial slit into a space between two coaxial guide walls. Guide vanes are provided in the orificial slit to impart a change of direction to the flow of processing gas. Each guide vane is a spatial body with differently extending, vertical limitation surfaces, which between adjacent vanes delimit ducts whose sectional area as measured transversely of the flow direction of the processing gas through the individual duct is substantially of the same size over the extent of the duct. The vertical height of the guide vanes may decrease along their radial extent inwards in the orificial slit, and their vertical limitation surfaces may form an acute angle at the radially innermost ends of the guide vanes.

REFERENCES:
patent: 3381713 (1968-05-01), Jacobsen
patent: 4226603 (1980-10-01), Larsson et al.
patent: 4227896 (1980-10-01), Larsson et al.
patent: 4571311 (1986-04-01), Ferguson, Jr. et al.

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