Gas dispersion shroud for high temperature processing of powders

Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Including solid reactant and means charging solids into – or...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

75 05B, 266182, F27B 1700

Patent

active

048806056

ABSTRACT:
Apparatus is disclosed for reacting a powder with a gas comprising a shroud consisting of a first section having a peripheral cylindrical wall with inner surface and outer surface. Inner surface defines a cavity which serves as reaction chamber in which powder and gas react. First section is detatchably mounted at top end to exit nozzle of high temperature source. First section has powder inlet opening(s) extending through peripheral wall from outer surface to inner surface, thereby connecting the outside with reaction chamber through which powder enters the chamber. Powder inlet opening(s) are positioned sufficiently close to exit nozzle to allow powder to melt and react with gas in the molten state. Second section forms cylindrical jacket skirting lower part of first section at a point below powder inlet openings. Jacket has outer peripheral wall, inner wall one and same with peripheral wall of first section, and top and bottom ring plates forming top and bottom walls respectively of second section. Walls of second section define a plenum. Second section has outer opening(s) through outer peripheral wall of jacket connecting outside with plenum through which gas enters from outside to plenum. Second section has two or more inner openings through inner wall of second section, which connect plenum with chamber through which gas enters chamber from plenum to react with powder in chamber. Inner openings are directed downward into chamber and tangential to inner surface of shroud. Resulting reaction product exits shroud through bottom end of chamber.

REFERENCES:
patent: 2025402 (1935-12-01), Jacques
patent: 2785061 (1957-03-01), Teidmann
patent: 3541025 (1970-11-01), Oda et al.
patent: 3600817 (1971-08-01), Klein
patent: 3862834 (1975-01-01), Van Waclowiczek et al.
patent: 4146359 (1979-03-01), Lumpkin et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Gas dispersion shroud for high temperature processing of powders does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Gas dispersion shroud for high temperature processing of powders, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas dispersion shroud for high temperature processing of powders will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1851863

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.