Gas discharge source, in particular for EUV radiation

X-ray or gamma ray systems or devices – Source

Reexamination Certificate

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C378S144000, C250S50400H

Reexamination Certificate

active

07630475

ABSTRACT:
A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.

REFERENCES:
patent: 2004/0105082 (2004-06-01), Koshelev et al.
patent: 2007/0152175 (2007-07-01), Moors et al.
patent: 10342239 (2005-06-01), None
patent: 0980735 (2000-02-01), None
patent: 1401248 (2004-03-01), None
patent: 2004062050 (2004-07-01), None
patent: 2005025280 (2005-03-01), None
patent: 2005101924 (2005-10-01), None
Borisov V. M. et al: EUV Sources Using XE and SN Discharge Plasmas, Journal of Physics D. Applied Physics, IOP, vol. 37, No. 23, pp. 3254-3265, XP002328702.
Pankert J, et al: Integrating Philips Extreme UV Source in the alpha-tools, SPIE-Int, Soc. Opt. Eng. vol. 5751, No. 1, May 6, 2005, pp. 260-271, XP002398185.

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