Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1983-03-16
1984-04-03
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118715, C23C 1500
Patent
active
044406185
ABSTRACT:
In a gas discharge device for causing a gas discharge to start at a first pressure in a hollow space between a pair of electrodes and to continue at a second pressure lower than the first pressure therein, a gas pressure adjusting part is coupled to the hollow space to adjust a pressure between the first and the second pressures. The adjusting part comprises a needle valve which is controllable between the first and the second pressures and which has a double tapered orifice portion. Alternatively, the adjusting part comprises first and second sections for allowing a gas to flow at higher and lower flow rates so as to provide the first and the second pressures, respectively. The first section may comprise an additional hollow space controlled by a pair of solenoid controlled valves. The adjusting part cooperates with at least one of a gas introducing system and a gas exhausting system.
REFERENCES:
patent: 4138306 (1979-02-01), Niwa
patent: 4270999 (1981-06-01), Hassan et al.
patent: 4283260 (1981-08-01), Thomas et al.
patent: 4345968 (1982-08-01), Coe
patent: 4369031 (1983-01-01), Goldman
Nakamura Kazuo
Suzuki Toshiyuki
Anelva Corporation
Demers Arthur P.
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