Gas discharge derived annular plasma pinch x-ray source

Details Gas discharge derived annular plasma pinch x-ray source Gas discharge derived annular plasma pinch x-ray source

1986-09-23

1988-06-21

Howell, Janice A.

X-ray or gamma ray systems or devices

Source

378121, 378122, H01J 3500

Patent

active

047529466

ABSTRACT:
This invention describes a pulsed plasma pinch x-ray source. In the device the initial plasma annulus is derived from an electrical gas discharge in a chamber having constricted openings arranged on a circle. This low mass plasma annulus is imploded and pinched by passing high current axially through said annulus. The hot and dense pinched plasma copiously emits x-rays and has the capability of being fired at high repetition rates. The device is simple for commercial applications, such as x-ray lithography.

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H. A. Hyman et al, Intense-Pulsed Plasma X-Ray Sources for Lithography: Mask Damage Effects, J. Vac. Sci. Technol., 21(4), Nov./Dec. 1982, pp. 1012-1016.
S. M. Matthews et al, Plasma Sources for X-Ray Lithography, SPIE, vol. 333, Submicron Lithography (1982), pp. 136-139.

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