Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – Waste gas purifier
Patent
1974-08-02
1982-12-07
Weisstuch, Aaron
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
Waste gas purifier
156345, 156643, 204192E, 204164, 204298, C23F 100, C23C 1500
Patent
active
043626327
ABSTRACT:
The admission of a gas to a reaction chamber which has been previously evacuated is followed by its excitation by either a high-frequency electrostatic field or an electromagnetic field, formed by capacitor plates or a coil, respectively, which envelops the outer wall of the reaction chamber. A perforated metallic cylinder is disposed within the chamber concentrically with the long axis of the chamber and comprises the material-handling zone of the chamber. The activated gas reacts with material placed within the perforated cylinder, during which reaction inactive gas and resultant gaseous byproducts are continuously withdrawn. The construction of the chamber and the internal perforated metallic cylinder are such as to provide very uniform distribution of gaseous excited species throughout the entire material-processing volume within the cylinder thereby promoting very uniform chemical conversions of practical interest.
REFERENCES:
patent: 2849357 (1958-08-01), Devins et al.
patent: 3410776 (1968-11-01), Bersin
patent: 3428548 (1969-02-01), Hollahan
patent: 3437864 (1969-04-01), Kofoid et al.
patent: 3503711 (1970-03-01), Skala
patent: 3526584 (1970-09-01), Shaw
patent: 3536602 (1970-10-01), Jones
patent: 3573192 (1971-03-01), Bersin et al.
patent: 3616461 (1971-10-01), Gorin
patent: 3619403 (1971-11-01), Gorin
patent: 3647676 (1972-03-01), Bersin
patent: 3671195 (1972-06-01), Bersin
patent: 3674666 (1972-07-01), Foster et al.
patent: 3705091 (1972-12-01), Jacob
patent: 3775621 (1973-11-01), Gorin
patent: 3879597 (1975-04-01), Bersin et al.
LFE Corporation
Weisstuch Aaron
LandOfFree
Gas discharge apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas discharge apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas discharge apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1902343