Chemistry: electrical current producing apparatus – product – and – Having earth feature
Reexamination Certificate
2005-09-27
2005-09-27
Ryan, Patrick Joseph (Department: 1745)
Chemistry: electrical current producing apparatus, product, and
Having earth feature
C429S047000, C428S297400, C428S367000, C442S334000, C442S349000
Reexamination Certificate
active
06949308
ABSTRACT:
A fuel cell gas diffusion substrate has primary fibres, secondary fibres and one or more thermoplastic polymers for binding the primary and secondary fibres, characterized in that the secondary fibers are in the form of carbon nanofibers, and a gas diffusion electrode and membrane electrode assembly prepared therefrom are disclosed.
REFERENCES:
patent: 5246794 (1993-09-01), Blomgren et al.
patent: 5691054 (1997-11-01), Tennent et al.
patent: 5800706 (1998-09-01), Fischer
patent: 0 731 520 (1996-09-01), None
patent: 0 791 974 (1997-08-01), None
patent: WO 97/32646 (1997-09-01), None
patent: WO 99/33132 (1999-07-01), None
patent: WO 00/47816 (2000-08-01), None
patent: WO 00/55933 (2000-09-01), None
D. Bevers er al., “Examination of the Influence of PTFE coating on the properties of carbon paper in polymer electrolyte fuel cells,”Journal of Power Sources,vol. 63 (1996), pp. 193-201.
International Search Report, dated Sep. 6, 2001, from corresponding International Application No. PCT/GB01/01655.
British Search Report, dated Feb. 23, 2001, from British priority application No. 0101942.1.
Edwards Stephen John
Gascoyne John Malcolm
Hards Graham Alan
Hogarth Karen Leanne
Ralph Thomas Robertson
Johnson Matthey Public Limited Company
Parsons Thomas H.
RatnerPrestia
Ryan Patrick Joseph
Technical Fibre Products Limited
LandOfFree
Gas diffusion substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Gas diffusion substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Gas diffusion substrate will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3366608